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AUTHOR(S): Stefan Kartunov
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TITLE About chemical Methods for Depositing thin and ultra-thin Layers |
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ABSTRACT The report examines the specific and less frequently used chemical methods for depositing thin and ultra-thin layers. Galvanic deposition, chemical reduction, anodic oxidation, electrophoretic and chemical vapor deposition and combined methods, known in practice as CVD methods (Chemical Vapor Deposition), are considered. Chemical methods can be assisted and by laser irradiation, have reactive sputtering variants and сoating application by plasma spraying. The principles of operation are also explained and the basic designs of the systems and tools for their implementation are shown. The characteristic parameters, materials, advantages and disadvantages, as well as examples of their application are indicated. Overall, the publication offers a wealth of experience gained over the past decades in the field of obtaining thin and ultra-thin layers in mechanical engineering and microtechnology. |
KEYWORDS Chemical Vapor Deposition galvanic deposition, chemical reduction, anodic oxidation, electrophoretic and chemical vapor deposition, CVD-combined methods |
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Cite this paper Stefan Kartunov. (2025) About chemical Methods for Depositing thin and ultra-thin Layers. International Journal of Chemistry and Chemical Engineering Systems, 10, 43-55 |
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